The Spectroscopic Ellipsometry (EL) Group integrates themes ranging from classical materials science and thin film characterization to nanometer-scale science and novel optical sensing concepts. We will host five oral sessions dedicated to traditional applications of spectroscopic ellipsometry in optical materials and thin film characterization as well as new and emerging topics. The aim of the Spectroscopic Ellipsometry group is to improve the accessibility of this conference for undergraduate and graduate students. To this end, we have worked with our industry partners to establish funding to offset the registration costs of students. Additionally, the J.A. Woollam Co. continues to proudly sponsor the Outstanding Student Oral Award as well as the Outstanding Student Poster Award.
EL1-ThA: Fundamental Ellipsometry Applications
- Morten Kildemo, Department of Physics; NTNU; Norway, “Mueller Matrix Ellipsometry for Optical Metasurfaces”
EL2-ThA: Evolving Methodology and Analytical Methods of Ellipsometry
- Maxwell Junda, Covalent Metrology, “Dirty Ellipsometry: Finding Success with Nonideal Samples and Nonideal Data in a Nonideal World”
EL-ThP: Spectroscopic Ellipsometry Poster Session
EL-FrM: Emerging Applications and Workforce Development
- Thomas Germer, National Institute of Standards and Technology (NIST), “Vacuum and Extreme Ultraviolet Scatterometry for Critical Dimension Metrology”
- Andrei Sirenko, New Jersey Institute of Technology, “Far-Infrared Mueller Matrix Ellipsometry and Vortex Beam Spectroscopy Using Synchrotron Radiation”
- Chris Sturm, University Leipzig, Germany, “Singular Propagation States of Electromagnetic Waves in Anisotropic Media”