The Thin Film Division (TF) is soliciting abstracts that describe recent advances in the processing, structure, properties, and applications of thin films. Abstracts spanning from fundamental science to scale-up and commercialization are all welcomed.
Areas of Interest: For AVS 70, TF is particularly seeking abstracts that fall under four broad thematic areas:
- Atomic Scale Processing for Thin Film Formation and Patterning (Part of Atomic Scale Processing Mini-Symposium): These sessions will highlight current advances in atomic-scale processes including energy-enhanced atomic layer deposition (ALD), thermally-driven atomic layer etching (ALE), area-selective ALD processing and patterning (ASD), and the integration of deposition with etching. These sessions will be integrated with the Atomic Scale Processing Mini-Symposium.
- Thin Film Processing for Microelectronics and Advanced Packaging: These sessions will bring together academic, government, and industrial researchers to address current challenges and opportunities in thin film processing for microelectronics and advanced packaging technologies, including CVD and ALD processes for the BEOL and advanced packaging applications and recent progress in the deposition processes for ferroelectrics and other functional materials for microelectronics and packaging.
- Vapor Deposition and Infiltration of Organic, Polymeric, and Hybrid Materials: This session will coalesce experts in the vapor deposition of organic, polymeric, and organic-inorganic hybrid materials including 2D and 3D frameworks using processes like molecular layer deposition (MLD), initiated chemical vapor deposition (iCVD), vapor infiltration (VPI, SIS, and ALI) and other related techniques to discuss recent advances in processing science, structure-property relations, and material applications.
- Emerging Applications of Thin Films: Energy, Sustainable Systems, and Extreme Environments: These sessions will address the use of thin film technologies outside of microelectronics including their use for energy generation and storage (e.g., photovoltaics and batteries), sustainable systems (e.g., membranes for chemical separations), and in extreme environment (e.g., space).
Harper Award
All graduate student participants are encouraged to submit an application for the Harper Award along with their abstract. In addition to giving their session talk, the four Harper Award finalists will compete in a special session giving interactive “TED-Style Talks” for the top prize: https://avs.org/awards/division-group-student-awards/thin-film-division-james-harper-award/
Special Session: Remembering Dr. Paul Holloway
The Thin Films Division will also hold a special session celebrating Dr. Paul Holloway’s contributions to thin film science and characterization and the broader scientific community over the last 50 years. Technical papers are solicited from former students and trainees, collaborators, and friends of Prof. Holloway to celebrate his contributions to the AVS and the field of thin films. Following the technical sessions, a reception will be held in Paul’s honor to highlight both Paul’s personal history and impact within the AVS. Tributes and toasts will honor his devotion to education and mentoring.
TF1: Thin Films Oral Session
Invited Speakers:
- Nicolas Boscher, Luxembourg Institute of Science and Technology (LIST), Luxembourg
- Kyeongiae Cho, University of Texas at Dallas, “Interlayer Engineering of Heterostructure Thermal Boundary Resistance of Power
Device Heat Spreader” - Adriana Creatore, Eindhoven University of Technology, Netherlands
- Nari Jeon, Chungnam National University, Republic of Korea
- Ken Lau, Rowan University
- Ebony Mays, Micron, “Unlocking the Atomic Canvas: Applications and Challenges of Area Selective Deposition in Next Generation Memory Devices”
- Austin Minnich, California Institute of Technology
- Miyoshi Nobuya, Hitachi High Technologies America Inc., “Highly Selective and Isotropic Atomic Layer Etching Using Dry Chemical Removal”
- Paul Ragogna, University of Western Ontario, Canada
- Bonggeun Shong, Hongik University, Republic of Korea, “Atomistic Simulations on the Fundamental Aspects of Atomic Layer Processing (ALP)“
- Tobias Wenger, Jet Propulsion Laboratory, “Nanoscale Metasurface Fabrication for UV- and Visible-Light Applications”
- Charles Winter, Wayne State University
TF2: Thin Films Special Session: Remembering Dr. Paul Holloway
Invited Speakers:
- Adrie Mackus, Eindhoven University of Technology, Netherlands
- Philip Rack, University of Tennessee Knoxville, “From Luminescent Materials to Fundamental Electron-Solid Interactions: How
Professor Holloway Made an Indelible Impression on My Career” - Loren Rieth, West Virginia University
- Hendrik Swart, University of the Free State, South Africa, “Stability of Phosphor Thin Films During Cathodoluminescence and Upconversion”
- Matthias Young, University of Missouri, “Growing Polymers Molecule by Molecule Through Vapor Deposition”
- Junjie Zhao, Zhejiang University, China, “Tuning Surface Radical Species for Area-Selective Initiated Chemical Vapor Deposition”
TF3: Thin Films Poster Session