The Atomic Scale Processing Mini-Symposium is aimed to provide a unique forum to expand the scope of atomic layer deposition (ALD) and atomic layer etching (ALE) processes toward understanding the fundamentals needed to achieve true atomic scale precision and the application of such processing on various areas of interest to the broader AVS community. The emphasis will be on synergistic efforts, across multiple AVS divisions and groups, to generate area-selective processes as well as novel characterization methods to advance the field of processing at the atomic scale. We are excited to offer several sessions in collaboration with Plasma Science & Technology Division, the Thin Film Division as well as the Electronic Materials and Photonics Division focusing on area selective deposition, atomic layer process chemistry and surface reactions, and atomic layer etching.
Areas of Interest: The Atomic Scale Processing Mini-Symposium is seeking abstracts in areas of interest including the following topics:
- Theme 1: Area Selective Processing and Patterning
- Theme 2: Advancing Metrology and Characterization to Enable Atomic Scale Processing
- Theme 3: Atomic Layer Processing: Integration of Deposition and Etching for Advanced Material Processing
- Theme 4: Thermal and Plasma Enhanced Atomic Layer Etching
- Theme 5: Thermal and Plasma-Enhanced Atomic Layer Deposition (ALD)
- Theme 6: Emerging Applications for ALD including Precursors and Surface Reactions
AP1: Atomic Scale Processing Mini-Symposium Oral Session
AP2: Atomic Scale Processing Mini-Symposium Poster Session