The Thin Film Division (TF) program provides a week-long forum for academic, government, and industrial researchers and practitioners to share new advances in the processing, structure, properties, and applications of thin films. Topics span from the fundamental science of thin film processing and characterization to the scale-up and commercialization of thin film deposition equipment and devices. Early in the week, TF sessions highlight fundamental scientific advances in controlling crystalline phases in thin films and advances in thin film technology for energy applications. Mid-week, the TF program hosts several sessions on the vapor deposition of organic, polymeric, and hybrid materials. At the end of the week, TF sessions focus on the use of thin films in microelectronics, including advances in ferroelectric and wide-bandgap thin films. The TF poster session on Thursday evening will span all these topical areas. Joint programming on atomic layer processing can be found early in the week in the Atomic Scale Processing Mini-Symposium, while early to mid-week joint programming on the use of thin films in microelectronics can be found within the Chips Act Mini-Symposium (early) and the Electronic Materials and Photonics Division program (mid).
This year, TF is also hosting a special Monday session (10:30 am – 5:30 pm) to honor and remember Prof. Paul Holloway, featuring talks from former students and collaborators as well as invited talks from prior years’ Holloway Young Investigator Award Winners. This year’s Holloway Young Investigator Award will be announced at this session.
Finally, on Monday evening, TF will also again host its popular student-focused session in which James Harper Award finalists will share their work in interactive “TED Talk” style presentations.
TF1-MoM: Thin Films for Energy Applications I: Green Fuels and Photovoltaics
- Mariadriana Creatore, Eindhoven University of Technology, The Netherlands, “Unravelling the Role of Stoichiometry of ALD Oxygen Evolution Electrocatalysts on Their Activity”
TF2-MoM: Thin Films Special Session: Remembering Dr. Paul Holloway I
- Philip Rack, Department of Materials Science and Engineering, University of Tennessee, Knoxville, “Fundamental Aspects of Focused Nanoscale Electron-Ion- and Photon-Beam Induced Processing and Recent Advances in Editing Transition Metal Dichalcogenide Materials and Devices”
- Hendrik Swart, University of the Free State, South Africa, “Stability of Phosphor Thin Films During Cathodoluminescence and Upconversion”
TF+AP-MoA: Thin Films Special Session: Remembering Dr. Paul Holloway II & Reception
- Adrie Mackus, Eindhoven University of Technology, Netherlands, “A Surface Science Approach to Advancing Area-Selective Deposition and Atomic Layer Etching”
- Loren Rieth, West Virginia University, “Solar Cells, Sensors, and Sensorimotor Neural Prosthetics: My Branch of the Holloway Tree”
- Matthias J. Young, University of Missouri-Columbia, “Growing Polymers Molecule by Molecule Through Vapor Deposition”
- Junjie Zhao, Zhejiang University, China, “Tuning Surface Radical Species for Area-Selective Initiated Chemical Vapor Deposition of Polymer Thin Films”
TF1-TuM: Thin Films: Controlling Crystalline Phases
- Jason Kawasaki, University of Wisconsin – Madison, “Peter Mark Memorial Award Talk: Strain-Induced Magnetism and Superconductivity in Single-Crystalline Heusler Membranes”
TF2-TuM: Thin Films for Extreme Environments
- Tobias Wenger, Jet Propulsion Laboratory (NASA/JPL), “Nanoscale Metasurfaces for UV Spectropolarimetric Applications”
TF1-TuA: Thin Films for Energy Applications II: Batteries
TF2-TuA: Vapor Synthesis of Hybrid, Organic, and Polymeric Materials (VSHOP I)
- Trisha Andrew, University of Massachusetts – Amherst, “Roll-to-Roll Photoinitiated Chemical Vapor Deposition of Polymer Films for Liquid-Repellent Textiles”
- Anna Maria Coclite, University of Bari, Italy, “Multi-Stimuli Responsive Sensors for Electronic Skin Applications”
TF-WeM: Vapor Synthesis of Hybrid, Organic, and Polymeric Materials (VSHOP II)
- Nicolas Boscher, Luxembourg Institute of Science and Technology (LIST), Luxembourg, “Chemical Vapor Deposition of Metalloporphyrins: Engineering and Integration of Advanced Conjugated Polymers for Catalysis and Sensing”
- Paul Ragogna, The University of Western Ontario, Canada, “Area Selective Deposition of Ferrocene-Functionalized Thin Films”
TF-WeA: Vapor Synthesis of Hybrid, Organic, and Polymeric Materials (VSHOP III)
- Nari Jeon, Chungnam National University, Republic of Korea, “Exploring New Avenues Resulting from the Rational Process Design of Sequential Infiltration Synthesis”
- Kenneth Lau, Rowan University, “Chemical Vapor Deposition of Polymers for Lithium Ion Batteries”
TF1+AP-ThM: Thin Films: Fundamentals of ALD
- Francisco Zaera, University of California – Riverside, “AVS Medard W. Welch Award Talk: The Surface Chemistry of the Atomic Layer Deposition of Metal Thin Films”
TF2+EM-ThM: Thin Films for Microelectronics I: BEOL
- Charles Winter, Wayne State University, “Inherently Selective Thermal Atomic Layer Deposition of Copper Metal Thin Films”
TF+EM-ThA: Thin Films for Microelectronics II: Ferroelectrics, Dielectrics, and Semiconductors
TF-ThP: Thin Films Poster Session
TF1+EM-FrM: Thin Films for Microelectronics III: Wide Band Gap Materials
- Kyeongjae Cho, University of Texas at Dallas, “Interlayer Engineering of Heterostructure Thermal Boundary Resistance of Power Device Heat Spreader”
TF2-FrM: Thin Films: Characterization