The Plasma Science & Technology Division (PSTD) program highlights state-of-the-art advances in plasma science, ranging from fundamental studies of plasma physics and chemistry to plasma-matter interactions and new applications for plasma processing. Our diverse international community from academia, national facilities, and industry focuses on the latest advancements in plasma research as applied to semiconductor fabrication and processing, as well as newer areas including atmospheric pressure plasmas, chemical and energy conversion, novel materials synthesis, catalysis, AI/ML, and biomedical applications where plasma is the enabling tool.
The PS program extends over the entire week and includes oral sessions in both the morning and afternoon, as well as an extensive poster session on Thursday evening. The week starts with talks on plasma processes for advanced logic and atmospheric pressure processing on Monday morning and transitions to the first block of talks on plasma surface interactions and plasma chemistry and catalysis. Tuesday morning is focused on plasma processes for advanced memory and plasma processing at cryogenic temperatures, the latter kicked off with an invited talk from the PSTD Plasma Prize winner Remi Dussart. Wednesday includes several sessions highlighting plasma modeling and new areas such as AI/ML applied to plasma processing and optimization. The entire day on Thursday is devoted to plasma sources, diagnostics, and control, and the afternoon finishes with a special FLASH session where poster presenters can give a 2-3 minute ‘teaser’ slide overview of their work to be presented in Thursday evening’s poster session. The week finishes on Friday morning with talks on plasma processes for coatings and thin films.
Invited talks throughout the week include atomic-level control of plasma etching, nonthermal plasmas for advanced manufacturing, diverse applications of atmospheric pressure plasmas, controlling plasma-surface interactions, dielectric etch challenges and breakthroughs, and modeling and AI in plasma optimization, to name a few. The program will also feature talks by the PSTD student finalists for this year’s Coburn and Winters Student Award.
Plasma-related talks can also be found in other sessions throughout the week, including the Atomic Scale Processing (AP), CHIPS Act (CPS), and Quantum Science and Technology (QS) Mini-Symposia.
Please note that Late Breaking Abstracts are still being accepted until 9/5/24!
PS1-MoM: Plasma Processes for Advanced Logic
- Masaru Izawa, Hitachi High-Tech Corp., Japan, “Atomic Level Control of Plasma Etching Using Various Pulsing and Cyclic Technologies for Leading-edge LSI”
PS2-MoM: Atmospheric Plasma Processing
- Michael Johnson, Naval Research Laboratory, USA, “Adapting Atmospheric Pressure Plasma Sources to Fit Diverse Applications “
PS1-MoA: Plasma Surface Interactions
- Masaru Hori, Nagoya University, Japan, “Advanced Semiconductor Plasma Processes Pioneered by Understanding and Controlling Plasma-Surface Interactions”
PS2-MoA: Plasma Chemistry and Catalysis I
- Kazunori Koga, Kyushu University, Japan, “Stress Reduction of Hydrogenated Amorphous Carbon Films by Controlling Incorporation of Carbon Nanoparticles”
PS1-TuM: Plasma Processes for Advanced Memory
- Youn-Jin Oh, Lam Research Corporation, “3D NAND Dielectric Etch Technology Challenges and Breakthrough”
PS2-TuM: Plasma Processing at Cryogenic Temperatures
- Remi Dussart, GREMI CNRS/Université d’Orléans, France, “Plasma Prize Award Talk: The Evolution of Cryogenic Etching Plasma Processes Since Their Introduction 35 Years Ago”
PS-TuA: Plasma Chemistry and Catalysis II
- Rebecca Anthony, Michigan State University, “Nonthermal Plasmas for Advanced Nanomanufacturing”
PS-WeM: Plasma Modelling
- Amanda Lietz, North Carolina State University, “Modeling to Inform Optimization of Radiofrequency Plasma Sources”
PS1-WeA: Plasma Modelling AI/ML
PS2-WeA: Plasma Processes for Emerging Device Technologies
PS-ThM: Plasma Sources, Diagnostics and Control I
- Timo Gans, Dublin City University, Ireland, “Sensing and Control of Radio-Frequency Driven Plasmas”
PS-ThA: Plasma Sources. Diagnostics and Control II
PS-ThP: Plasma Science and Technology Poster Session
PS+TF-FrM: Plasma Processes for Coatings and Thin Films